Van der Waals heterostructure of graphene and As2S3: Tuning the Schottky barrier height by vertical strain

被引:1
作者
Liu, Xuefei [1 ]
Lv, Bing [1 ]
Ding, Zhao [2 ]
Luo, Zijiang [3 ]
机构
[1] Guizhou Normal Univ, Key Lab Low Dimens Condensed Matter Phys, Higher Educ Inst Guizhou Prov, Guiyang 550025, Peoples R China
[2] Guizhou Univ, Coll Big Data & Informat Engn, Guiyang 550025, Peoples R China
[3] Guizhou Univ Finance & Econ, Coll Informat, Guiyang 550025, Peoples R China
基金
中国国家自然科学基金;
关键词
Graphene/As2S3; interface; Vertical strain; Schottky barrier height; First principles; TRANSITION-METAL DICHALCOGENIDES; ELECTRONIC-PROPERTIES; CONTACT; MOS2;
D O I
10.1016/j.jcrysgro.2020.125882
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Graphene-based van der Waals (vdW) heterojunction has attracted increasing attention in the field of optoelectronics, nanoelectronics, and spintronics. The tunability of Schottky barrier height (SBH) formed in such kind of heterojunction is rather of significance for practical applications. In this study, based on first-principles calculations, we have systematically investigated the electronic structures and interfacial characteristics of graphene/As2S3 heterojunction. The results show the intrinsic electronic properties of the corresponding individual counterparts are preserved after contacting. The Bader charge analysis indicates the transferred amounts of electrons from As2S3 to graphene increasing with the decrease of interlayer distance. Consequently, the Schottky contact will be tuned from n-type into p-type once the interlayer distance is lower than 2.78 angstrom. Our findings imply that the SBH is controllable, which is highly desirable in the nano-electronic devices.
引用
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页数:6
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