ELECTROPLASTIC EFFECT ASSOCIATED WITH THE DISLOCATION GENERATION IN THE INITIALLY DISLOCATION-FREE SILICON WHISKERS

被引:0
|
作者
Ermakov, A. P. [1 ]
Proskurin, D. K. [1 ]
Ermakov, S. A. [2 ]
Chernoyarov, O. V. [3 ]
机构
[1] Voronezh State Univ Architecture & Civil Engn, 84,20 Letiya Oktyabrya Str, Voronezh 394006, Russia
[2] Voronezh State Tech Univ, Voronezh, Voronezhskaya O, Russia
[3] Moscow Power Engn Inst, Natl Res Inst, Moscow, Russia
来源
2014 24TH INTERNATIONAL CRIMEAN CONFERENCE MICROWAVE & TELECOMMUNICATION TECHNOLOGY (CRIMICO) | 2014年
基金
俄罗斯科学基金会;
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Experiments on local high-intensity electric current pulse effect on mechanical properties of silicon whiskers made it possible to reveal a novel type of electroplastic effect associated with the generation of dislocations. The procedure of electric current effect by single impulses on the silicon whiskers of the having the highest specific strength from all investigated versions of shapes of a solid body is offered. The structure of crystals in an initial state and aflerthe effect by single impulses of current of various density is investigated.
引用
收藏
页码:692 / 693
页数:2
相关论文
共 50 条
  • [1] DISLOCATION GENERATION ALONG SWIRLS IN DISLOCATION-FREE SILICON CRYSTALS
    MATSUI, J
    KAWAMURA, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (03) : C94 - &
  • [2] Dislocation generation in dislocation-free germanium
    Smirnov Yu.M.
    Kaplunov I.A.
    Dolmatov A.B.
    Russian Physics Journal, 2005, 48 (5) : 460 - 464
  • [3] EFFECT OF DOPING ON THE BEHAVIOR OF MICRODEFECTS IN DISLOCATION-FREE SILICON
    POSTOLOV, VG
    BUBLIK, VT
    KOVEV, EK
    LITVINOV, YM
    INORGANIC MATERIALS, 1987, 23 (11) : 1559 - 1562
  • [4] IMPURITY CLOUDS IN DISLOCATION-FREE SILICON
    VORONKOV, VV
    VORONKOVA, GI
    ZUBOV, BV
    KALINUSHKIN, VP
    KLIMANOV, EA
    MURINA, TM
    PROKHOROV, AM
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1979, 13 (05): : 498 - 502
  • [5] PRECIPITATION OF OXYGEN IN DISLOCATION-FREE SILICON
    TEMPELHOFF, K
    SPIEGELBERG, F
    GLEICHMANN, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (03) : C116 - C116
  • [6] PRECIPITATION OF OXYGEN IN DISLOCATION-FREE SILICON
    TEMPELHOFF, K
    SPIEGELBERG, F
    GLEICHMANN, R
    WRUCK, D
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 56 (01): : 213 - 223
  • [7] VACANCY CLUSTERS IN DISLOCATION-FREE SILICON
    KOCK, AJRD
    APPLIED PHYSICS LETTERS, 1970, 16 (03) : 100 - &
  • [8] DISLOCATION SOURCES IN DISLOCATION-FREE SILICON SINGLE-CRYSTALS
    MAKARA, VA
    SIZONTOV, VM
    UKRAINSKII FIZICHESKII ZHURNAL, 1984, 29 (08): : 1226 - 1230
  • [9] MICRODEFECTS IN DISLOCATION-FREE SILICON CRYSTALS
    DEKOCK, AJR
    PHILIPS RESEARCH REPORTS, 1973, (01): : 1 - 102
  • [10] DISLOCATION GENERATION IN DISLOCATION-FREE SI SUBJECTED TO GETTER THERMOPROCESSING
    ALEKSIN, VP
    IGNATEVA, LA
    LITVINOV, YM
    MOISEENKO, NF
    SOROKINA, MT
    SOVIET MICROELECTRONICS, 1985, 14 (05): : 207 - 210