GENERATION AND APPLICATION OF HIGH DENSITY LOW-FREQUENCY INDUCTIVELY COUPLED PLASMAS

被引:0
|
作者
Xu, Shuyan [1 ,2 ]
Ostrikov, Kostya [2 ,3 ]
机构
[1] Nanyang Technol Univ, Plasma Sources & Applicat Ctr, NIE, Singapore, Singapore
[2] Nanyang Technol Univ, Inst Adv Studies, Singapore, Singapore
[3] Univ Sydney, Sch Phys, Plasma Nanosci, Sydney, NSW, Australia
来源
STATISTICAL PHYSICS, HIGH ENERGY, CONDENSED MATTER AND MATHEMATICAL PHYSICS | 2008年
关键词
D O I
10.1142/9789812794185_0083
中图分类号
O29 [应用数学];
学科分类号
070104 ;
摘要
引用
收藏
页码:548 / 548
页数:1
相关论文
共 50 条
  • [41] LOW-FREQUENCY INSTABILITIES IN ACCELERATING PLASMAS
    VARMA, RK
    SHUKLA, PK
    RAO, NN
    YU, MY
    PHYSICA SCRIPTA, 1986, 34 (02): : 175 - 176
  • [42] Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process
    Ee, YC
    Chen, Z
    Wang, WD
    Chi, DZ
    Xu, S
    Law, SB
    SURFACE & COATINGS TECHNOLOGY, 2005, 198 (1-3): : 291 - 295
  • [43] APPLICATION OF INDUCTIVELY COUPLED PLASMAS TO ANALYSIS OF GEOCHEMICAL SAMPLES
    SCOTT, RH
    KOKOT, ML
    ANALYTICA CHIMICA ACTA, 1975, 75 (02) : 257 - 270
  • [44] Modeling and diagnostics of low pressure inductively coupled plasmas
    Kortshagen, U
    ELECTRON KINETICS AND APPLICATIONS OF GLOW DISCHARGES, 1998, 367 : 329 - 347
  • [45] Low-frequency ferromagnetic enhanced inductively coupled plasma for plasma-assisted nitriding
    Isupov, M. V.
    Pinaev, V. A.
    ALL-RUSSIAN CONFERENCE XXXIV SIBERIAN THERMOPHYSICAL SEMINAR, DEDICATED TO THE 85TH ANNIVERSARY OF ACADEMICIAN A. K. REBROV, 2018, 1105
  • [46] The fabrication and application of ZnO:Al thin films in low-frequency inductively coupled plasma fabricated silicon solar cell
    Yan, W. S.
    Ong, T. M.
    Zhou, H. P.
    Xu, S.
    THIN SOLID FILMS, 2012, 520 (23) : 6900 - 6904
  • [47] Etch Damage of SiOC Thin Films in an Inductively Coupled Plasma Using Low-Frequency
    Kim, Jinhyuk
    Choi, Gilyoung
    Lee, Daekug
    APPLIED SCIENCE AND CONVERGENCE TECHNOLOGY, 2024, 33 (01): : 27 - 31
  • [48] Relative atomic chlorine density in inductively coupled chlorine plasmas
    Hebner, GA
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (02) : 578 - 581
  • [49] Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas
    Kim, Ju-Ho
    Kwon, Deuk-Chul
    Chung, Chin-Wook
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2020, 38 (02):
  • [50] Measurements of relative BCl density in BCl3-containing inductively coupled radio frequency plasmas
    Fleddermann, CB
    Hebner, GA
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (08) : 4030 - 4036