Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

被引：65

作者：

Bai, Wubin ^{[1
]}

Hannon, Adam F. ^{[1
]}

Gotrik, Kevin W. ^{[1
]}

Choi, Hong Kyoon ^{[1
]}

Aissou, Karim ^{[1
]}

Liontos, George ^{[2
]}

Ntetsikas, Konstantinos ^{[2
]}

Alexander-Katz, Alfredo ^{[1
]}

Avgeropoulos, Apostolos ^{[2
]}

Ross, Caroline A. ^{[1
]}

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[2] Univ Ioannina, Dept Mat Sci Engn, Ioannina 45110, Greece

来源：

MACROMOLECULES | 2014年 / 47卷 / 17期

基金：

美国国家科学基金会;

关键词：

DIBLOCK COPOLYMER; MOLECULAR-WEIGHT; PHASE; ORIENTATION; ARRAYS; LITHOGRAPHY; PATTERNS; POLY(DIMETHYLSILOXANE); DIMETHYLSILOXANE; TRANSITIONS;

D O I：

10.1021/ma501293n

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.

引用

页码：6000 / 6008

页数：9

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