Cathodoluminescence study of GaAs quantum wells and of submicron dots fabricated by magnetron reactive ion etching

被引:9
作者
Chao, LL
Cargill, GS
Levy, M
Osgood, RM
McLane, GF
机构
[1] COLUMBIA UNIV,COLUMBIA RADIAT LAB,NEW YORK,NY 10027
[2] USA,RES LAB,FT MONMOUTH,NJ 07703
关键词
D O I
10.1063/1.119124
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cathodoluminescence has been employed to investigate the luminescence and lateral transport properties of excited carriers at 8 K in GaAs-AlGaAs quantum well material and in submicron features fabricated in this material by magnetron reactive ion etching. A carrier diffusion length of 0.85+/-0.04 mu m in quantum wells and a surface recombination velocity (5.4+/-0.8)x 10(3) m/s at etched sidewalls were measured. Also, the effect of feature size on luminescence efficiency was examined and compared with model calculations using the measured values of diffusion length and surface recombination velocity. (C) 1997 American Institute of Physics.
引用
收藏
页码:408 / 410
页数:3
相关论文
共 11 条
[1]  
CHAO LC, UNPUB
[2]  
CHAO LL, 1996, MATER RES SOC S P, V406, P541
[3]   DETERMINATION OF NONRADIATIVE SURFACE-LAYER THICKNESS IN QUANTUM DOTS ETCHED FROM SINGLE QUANTUM WELL GAAS/ALGAAS [J].
CLAUSEN, EM ;
CRAIGHEAD, HG ;
WORLOCK, JM ;
HARBISON, JP ;
SCHIAVONE, LM ;
FLOREZ, L ;
VANDERGAAG, B .
APPLIED PHYSICS LETTERS, 1989, 55 (14) :1427-1429
[4]   OPTICAL SPECTROSCOPY ON ONE-DIMENSIONAL COMPOUND SEMICONDUCTOR STRUCTURES [J].
FORCHEL, A ;
MAILE, BE ;
LEIER, H ;
MAYER, G ;
GERMANN, R .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1990, 159 (01) :457-470
[5]   Luminescence properties of submicron features fabricated by using magnetron reactive ion etching with different sample biases [J].
Freiler, M ;
McLane, GF ;
Kim, S ;
Levy, M ;
Scarmozzino, R ;
Herman, IP ;
Osgood, RM .
APPLIED PHYSICS LETTERS, 1995, 67 (26) :3883-3885
[6]  
FREILER MB, UNPUB
[7]   ELECTRON-BEAM EXCITED MINORITY-CARRIER DIFFUSION PROFILES IN SEMICONDUCTORS [J].
HACKETT, WH .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) :1649-&
[8]   APPLICATION OF SELECTIVE EPITAXY TO FABRICATION OF NANOMETER SCALE WIRE AND DOT STRUCTURES [J].
LEBENS, JA ;
TSAI, CS ;
VAHALA, KJ ;
KUECH, TF .
APPLIED PHYSICS LETTERS, 1990, 56 (26) :2642-2644
[9]   RADIATIVE RECOMBINATION IN GAAS-ALXGA1-XAS QUANTUM DOTS [J].
WANG, PD ;
TORRES, CMS ;
BENISTY, H ;
WEISBUCH, C ;
BEAUMONT, SP .
APPLIED PHYSICS LETTERS, 1992, 61 (08) :946-948
[10]   CATHODOLUMINESCENCE SCANNING ELECTRON-MICROSCOPY OF SEMICONDUCTORS [J].
YACOBI, BG ;
HOLT, DB .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) :R1-R24