Structural, electrochemical and optical properties of NiOxHy thin films prepared by electrochemical deposition

被引：24

作者：

Liu, Huaran ^{[1
]}

Yan, Gangyin ^{[1
]}

Liu, Fang ^{[1
]}

Zhong, Yiye ^{[1
]}

Feng, Boxue ^{[1
]}

机构：

[1] Lanzhou Univ, Key Lab Magnetism & Magnet Mat, Minist Educ, Lanzhou 730000, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 481卷 / 1-2期

关键词：

Nickel hydroxide; Electrochemical deposition; Electrochromism; Optical properties; NICKEL-OXIDE FILMS; ELECTROCHROMIC PROPERTIES; TUNGSTEN-OXIDE; DEVICES;

D O I：

10.1016/j.jallcom.2009.03.015

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Nickel hydroxide thin films were deposited on SnO2/glass substrates by electrochemical deposition. The structural, electrochemical and optical properties of nickel hydroxide films were investigated using XRD, STM, cyclic voltammetry and spectrometer, respectively. The mechanism of the chemical deposition process was discussed. The deposition rate of the films as a function of molar concentration of NH4OH was also obtained in this study. gamma-NiOOH was synthesized in the colored films. The maximum value of optical density change was found at 460 nm in visible spectrum. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.

引用

页码：385 / 389

页数：5

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