High-field transport in amorphous carbon and carbon nitride films

被引:14
|
作者
Kumar, S
Godet, C [1 ]
Goudovskikh, A
Kleider, JP
Adamopoulos, G
Chu, V
机构
[1] Ecole Polytech, UMR 7647 CNRS, Phys Interfaces & Couches Minces Lab, F-91128 Palaiseau, France
[2] INESC, P-1000029 Lisbon, Portugal
[3] Lab Genie Elect Paris, F-91190 Gif Sur Yvette, France
关键词
D O I
10.1016/j.jnoncrysol.2004.02.071
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The temperature and electric field dependence of the current density in hydrogenated amorphous carbon and carbon nitride sandwich devices show a T-1/4 dependence of the ohmic conductivity sigma = sigma(00) - exp[-(T-0/T)(1/4)] characteristic of 3D hopping, a linear correlation between the apparent Lnsigma(00)(F) and T-0(F) values, and a F/T-3/2 scaling of sigma(F, T). The F-2 dependence of Lnsigma(F, T) at intermediate fields, provides similar values of the decay length gamma(-1) of localized 71 state wavefunctions in a-CNx:H (2.4 nm) and a-C:H (2.8 nm) films. The larger conductivity in nitrogen-rich alloys is attributed to a combined effect of N-induced increase in the pi-state density and ordering of the sp(2) phase. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:349 / 352
页数:4
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