Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation

Boron-doped titanium dioxide (B-TiO2) films were deposited by atmospheric pressure chemical vapour deposition of titanium(IV) chloride, ethyl acetate and tri-isopropyl borate on steel and fluorinedoped-tin oxide substrates at 500, 550 and 600 degrees C, respectively. The films were characterised using powder X-ray diffraction (PXRD), which showed anatase phase TiO2 at lower deposition temperatures (500 and 550 degrees C) and rutile at higher deposition temperatures (600 degrees C). X-ray photoelectron spectroscopy (XPS) showed a dopant level of 0.9 at% B in an O-substitutional position. The ability of the films to reduce water was tested in a sacrificial system using 365 nm UV light with an irradiance of 2 mW cm(-2). Hydrogen production rates of B-TiO2 at 24 mu L cm(-2) h(-1) far exceeded undoped TiO2 at 2.6 mu L cm(-2) h(-1). The B-TiO2 samples were also shown to be active for water oxidation in a sacrificial solution. Photocurrent density tests also revealed that B-doped samples performed better, with an earlier onset of photocurrent.