High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography

被引：27

作者：

Cheong, WC ^{[1
]}

Yuan, XC ^{[1
]}

Koudriachov, V ^{[1
]}

Yu, WX ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

来源：

OPTICS EXPRESS | 2002年 / 10卷 / 14期

关键词：

D O I：

10.1364/OE.10.000586

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22muC/cm(2) and 0.33muC/cm(2). (C) 2002 Optical Society of America.

引用

页码：586 / 590

页数：5

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