Loop punching and bubble rupture causing surface roughening - A model for W fuzz growth

被引:90
作者
Lasa, A. [1 ]
Tahtinen, S. K. [1 ]
Nordlund, K. [1 ]
机构
[1] Univ Helsinki, Dept Phys, Assoc Euratom Tekes, FI-00014 Helsinki, Finland
关键词
TUNGSTEN; HELIUM; SIMULATIONS; DIFFUSIVITY; IRRADIATION; ROUGHNESS; DYNAMICS; ATOMS;
D O I
10.1209/0295-5075/105/25002
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We develop a multi-scale computational model for studying tungsten fuzz formation under low-energy He irradiation. The molecular dynamics and kinetic Monte Carlo results show that the W fuzz growth mechanism is the following: the He atoms are trapped in W, forming bubbles and causing growth by loop punching. The bubbles close to the surface rupture. The balance between these processes leads to a stochastic surface growth, causing the surface roughness and fuzz thickness growth to scale as root t. The growth rates agree with the experimental results. Copyright (c) EPLA, 2014
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页数:6
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