High power GaN-HEMT for wireless base station applications

被引:14
作者
Kikkawa, Toshihide [1 ]
Joshin, Kazukiyi [1 ]
机构
[1] Fujitsu Labs Ltd, Compound Semicond Devices Lab, Atsugi, Kanagawa 2430197, Japan
关键词
GaN; HEMT; base station; amplifier; W-CDMA;
D O I
10.1093/ietele/e89-c.5.608
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Highly reliable GaN high electron mobility transistors (HEMTs) are demonstrated for 3G-wireless base station applications. A state-of-the-art 250-W AlGaN/GaN-HEMTs push-pull transmitter amplifier operated at a drain bias voltage of 50V is addressed with high efficiency under W-CDMA signals. The amplifier, combined with a digital pre-distortion (DPB) system, also achieved an adjacent channel leakage power ratio (ACLR) of less than -50 dBc for 4-carrier W-CDMA signals. Memory effect and temperature characteristics are also discussed. A stable operation including gate leakage current under RF stress testing for 1000 h is demonstrated at a drain bias voltage of 60 V. AlGaN/GaN HEMTs on an n-type doped 3-inch SiC substrate is introduced towards low cost manufacturing for the first time.
引用
收藏
页码:608 / 615
页数:8
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