Single-electron tunneling through amorphous carbon dots array

被引：11

作者：

Miura, N ^{[1
]}

Numaguchi, T ^{[1
]}

Yamada, A ^{[1
]}

Konagai, M ^{[1
]}

Shirakashi, J ^{[1
]}

机构：

[1] ELECTROTECH LAB, TSUKUBA, IBARAKI 305, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 12A期

关键词：

electron-beam-induced deposition; carbon dots; single-electron tunneling; Coulomb blockade; Coulomb staircase;

D O I：

10.1143/JJAP.36.L1619

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Minute amorphous carbon dots were fabricated by electron-beam-induced deposition (EBID) carried out in a scanning electron microscope (SEM) system. The use of residual hydrocarbon molecules as a precursor enabled easy nanostructure fabrication. By optimizing electron-beam conditions, dots with a diameter of as small as 40 nm were successfully obtained. They were arranged in series between fine metal electrodes to form a device with multiple-tunnel junctions. Single-electron charging effects, such as the Coulomb blockade and the Coulomb staircase, were clearly observed at 9.4 K.

引用

页码：L1619 / L1621

页数：3

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