Magnetic properties, microstructures, and corrosion resistance of high-saturation FeMoN and FeRhN films for recording heads

被引:3
|
作者
Wang, SX [1 ]
Sin, K
Hong, J
Nguyentran, L
机构
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[2] Read Rite Corp, Fremont, CA 94539 USA
[3] Fujitsu Ltd, File Memory Lab, Atsugi, Kanagawa 2430197, Japan
[4] IBM Storage Syst Div, San Jose, CA 92037 USA
基金
美国国家科学基金会;
关键词
corrosion resistance; FeXN; high-saturation magnetic materials; magnetic properties; microstructures; reactive sputtering; recording heads;
D O I
10.1109/20.825827
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We:have investigated high-saturation FeMoN and FeRhN films, deposited by radio frequency -diode reactive sputtering on alumina-TiC substrates, for inductive head applications, A minimum coercivity of similar to 1.2 Oe is obtained in (Fe97.8Mo2.2)N films:at a N-2/Ar flow ratio of similar to 6.2%, A minimum coercivity of similar to 1.6 Oe is obtained in (Fe96.9Rh3.1)N films at a N2/Ar flow ratio of similar to 4.6%. The films mainly consist of alpha-Fe phase and gamma'-Fe4N phase, The magnetic properties of these films are stable under easy-axis field:annealing up to 350 degrees C. Addition of Rh or Mo to FeN has resulted in a significant improvement in corrosion resistance over that of FeN, The localized corrosion resistance of FeRhN and FeMoN can be comparable to that of Permalloy, In contrast, their,intrinsic corrosion resistance is inferior to that of Permalloy, but it can be adjusted and controlled by pH level.
引用
收藏
页码:513 / 520
页数:8
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