Effect of molybdenum doping on the electrochromic properties of tungsten oxide thin films by RF magnetron sputtering

被引:57
作者
Madhavi, V. [1 ]
Kumar, P. Jeevan [2 ]
Kondaiah, P. [1 ]
Hussain, O. M. [1 ]
Uthanna, S. [1 ]
机构
[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India
[2] NMIT, Dept Phys, Bangalore 560069, Karnataka, India
关键词
Molybdenum; Doping; Tungsten trioxide; RF magnetron sputtering;
D O I
10.1007/s11581-014-1073-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of pure and molybdenum (Mo)-doped tungsten trioxide (WO3) were deposited on indium tin oxide (ITO)-coated glass and Corning glass substrates by RF magnetron sputtering technique. The effect of Mo doping on the structural, morphological, optical and electrochromic properties of WO3 films was studied systematically. The energy dispersive X-ray analysis (EDAX) revealed that the films consist of molybdenum concentrations from 0 to 2 at.%. X-ray diffraction (XRD) studies indicated that with the increase of Mo concentration the structural phase transformation takes place from polycrystalline to amorphous phase. The crystallite size of the films decreased from 24 to 12 nm with increase of doping concentration of Mo in WO3. Scanning electron microscope (SEM) analysis revealed that Mo dopant led to significant changes in the surface morphology of the films. The electrochemical and electrochromic performance of the pure and Mo-doped WO3 were studied. The WO3 films formed with 1.3 at.% Mo dopant concentration exhibited high optical modulation of 44.3 % and coloration efficiency of 42.5 cm(2)/C.
引用
收藏
页码:1737 / 1745
页数:9
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