Atom and ion chemistry in low pressure hydrogen DC plasmas

被引:114
作者
Mendez, I.
Gordillo-Vazquez, F. J.
Herrero, V. J.
Tanarro, I.
机构
[1] CSIC, Inst Estructura Mat, E-28006 Madrid, Spain
[2] CSIC, Inst Opt, E-28006 Madrid, Spain
关键词
D O I
10.1021/jp057182+
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The chemical composition of a low-pressure hydrogen dc plasma produced in a hollow cathode discharge has been measured and modeled. The concentrations of H atoms and of H+, H2+ and H3+ ions were determined with a combination of optical spectroscopic and mass spectrometric techniques, over the range of pressures ( p similar to 0.008-0.2 mbar) investigated. The results were rationalized with the help of a zero-order kinetic model. A comparatively high fraction (similar to 0.1 +/- 0.05) of H atoms, indicative of a relatively small wall recombination, was observed. Low ionization degrees (< 10(-4)) were obtained in all cases. In general, the ionic composition of the plasma was found to be dominated by H-3(+), except at the lowest pressures, where H-2+ was the major ion. The key physicochemical processes determining the plasma composition were identified from the comparison of experimental and model results, and are discussed in the paper.
引用
收藏
页码:6060 / 6066
页数:7
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