Aberration properties of odd-order surfaces in optical design

被引:4
作者
Tanabe, Takao [1 ,2 ]
Shibuya, Masato [1 ]
机构
[1] Tokyo Polytech Univ, Fac Engn, 1583 Iiyama, Atsugi, Kanagawa 2430297, Japan
[2] Hakuto Corp, Elect Equipment Div, Design & Dev Sect, Shinjuku Ku, 1-13 Shinjuku,1 Chome, Tokyo 1608910, Japan
关键词
Seidel aberration; odd-order aspherical surface; extreme ultraviolet lithography projection optics;
D O I
10.1117/1.OE.55.12.125107
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We theoretically represent the effectiveness of the odd-order surface for optical designs via an aberration theory. The theory employs an expression of the odd-order surface with aberration coefficients, which are derived by power-series expansion of wavefront aberration with respect to the coordinates of optical surfaces. This expression allows us to understand the aberration characteristics of odd-order surfaces. By applying this aberration theory to the design of extreme ultraviolet lithography optics, we show that odd-order surfaces are effective in reducing higher-order aberrations with fewer coefficients than even-order surfaces do. (C) The Authors. Published by SPIE
引用
收藏
页数:11
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