Growth and fundamentals of bulk β-Ga2O3 single crystals

被引:67
|
作者
Mohamed, H. F. [1 ,2 ]
Xia, Changtai [1 ]
Sai, Qinglin [1 ]
Cui, Huiyuan [1 ]
Pan, Mingyan [1 ]
Qi, Hongji [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
[2] Sohag Univ, Fac Sci, Phys Dept, Sohag 82524, Egypt
基金
中国国家自然科学基金;
关键词
beta-Ga2O3; crystal structure; bulk crystal growth; applications; CONTROLLED PROFILE CRYSTALS; DOPED BETA-GA2O3; ELECTRICAL-PROPERTIES; ELECTRONIC-STRUCTURE; OPTICAL-PROPERTIES; EDGE; MELT; 1ST-PRINCIPLES; CONDUCTIVITY; BETA-GA-2O-3;
D O I
10.1088/1674-4926/40/1/011801
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The rapid development of bulk beta-Ga2O3 crystals has attracted much attention to their use as ultra-wide bandgap materials for next-generation power devices owing to its large bandgap (similar to 4.9 eV) and large breakdown electric field of about 8 MV/cm. Low cost and high quality of large beta-Ga2O3 single-crystal substrates can be attained by melting growth techniques widely used in the industry. In this paper, we first present an overview of the properties of beta-Ga2O3 crystals in bulk form. We then describe the various methods for producing bulk beta-Ga2O3 crystals and their applications. Finally, we will present a future perspective of the research in the area in the area of single crystal growth.
引用
收藏
页数:9
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