Preparation and Characterization of Nickel Oxide Thin Films by Direct Current Reactive Magnetron Sputtering at Different Substrate Temperatures

被引：11

作者：

Reddy, A. Mallikarjuna ^{[1
,2
]}

Byun, Chang Woo ^{[2
]}

Joo, Seung Ki ^{[2
]}

Reddy, A. Sivasankar ^{[3
]}

Reddy, P. Sreedhara ^{[1
]}

机构：

[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India

[2] Seoul Natl Univ, Res Inst Adv Mat, Dept Mat Sci & Engn, Seoul 151744, South Korea

[3] Kongju Natl Univ, Div Adv Mat Engn, Cheonan 330717, South Korea

来源：

ELECTRONIC MATERIALS LETTERS | 2014年 / 10卷 / 05期

关键词：

reactive sputtering; substrate temperature; structural and morphological properties; optical properties; electrical properties; CRYSTALLOGRAPHIC ORIENTATIONS; ELECTROCHROMIC PROPERTIES; ELECTRICAL-PROPERTIES; NIO; DEPOSITION;

D O I：

10.1007/s13391-014-2181-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The influence of substrate temperature on the properties NiO films, prepared by de reactive magnetron sputtering technique, is studied by various characterization methods. X-ray diffraction studies revealed that the crystal structure is highly influenced by the substrate temperature. The optical results indicated that the optical transmittance and band gap of the films increased with the increase of substrate temperature up to 523 K. The optical band gap of NiO films decreases from 3.82 to 3.70 eV with the increase of substrate temperature from 523 to 723 K. The electrical resistivity decreased with the increase of substrate temperature from 303 to 723 K, whereas carrier concentration and Hall mobility increased with increasing the substrate temperature.

引用

页码：887 / 892

页数：6

共 31 条

[21] Pankove J.I., 1971, OPTICAL PROCESS SEMI
[22] Preparation and characterization of spray pyrolyzed nickel oxide (NiO) thin films
Patil, PS
Kadam, LD
[J]. APPLIED SURFACE SCIENCE, 2002, 199 (1-4) : 211 - 221
[23] Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films
Reddy, A. Mallikarjuna
Reddy, A. Sivasankar
Reddy, P. Sreedhara
[J]. MATERIALS CHEMISTRY AND PHYSICS, 2011, 125 (03) : 434 - 439
[24] Growth and surface morphology of textured NiO thin films deposited by off-axis RF magnetron sputtering
Ryu, HW
Choi, GP
Hong, GJ
Park, JS
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (8A): : 5524 - 5525
[25] Preparation and characterization of nanostructured NiO thin films by reactive-pulsed laser ablation technique
Sasi, B.
Gopchandran, K. G.
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2007, 91 (15-16) : 1505 - 1509
[26] van der Pauw L J., 1958, PAUW, Philips Research Reports, V13, P1
[27] WANG LJ, 1993, NIPPON SERAM KYO GAK, V101, P227, DOI 10.2109/jcersj.101.227
[28] Electrochromic properties of porous NiO thin films prepared by a chemical bath deposition
Xia, X. H.
Tu, J. P.
Zhang, J.
Wang, X. L.
Zhang, W. K.
Huang, H.
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2008, 92 (06) : 628 - 633
[29] Chemical vapor deposition of nickel oxide films from bis-π-cyclopentadienyl-nickel
Yeh, WC
Matsumura, M
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (11): : 6884 - 6887
[30] NICKEL-OXIDE ELECTROCHROMIC THIN-FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
YOSHIMURA, K
MIKI, T
TANEMURA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (5A): : 2440 - 2446

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