Simulation of imaging in projection microscope using multi-beam probes

被引：2

作者：

Ko, YU ^{[1
]}

Joy, DC ^{[1
]}

机构：

[1] Univ Tennessee, EM Facil, Knoxville, TN 37996 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2 | 2002年 / 4689卷

关键词：

projection microscope; secondary electron; photoelectron microscopy; mirror electron microscopy; parallel beam imaging; multi beam source;

D O I：

10.1117/12.473497

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In the projection microscope beams of electrons or photons are used to produce secondary electron, photoelectron, or mirror electron images. Procedures to simulate these images are described. The results show we can see images for patterns such as square and dense lines without charging and damage to the objects. This research can be used for quantitative analysis of projection microscope using multi beam sources to get comprehensive information on chemical and optical characteristics of objects as well as topographic information.

引用

页码：565 / 575

页数：11

共 17 条

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