Metal-insulator-semiconductor electrostatics of carbon nanotubes

被引:97
作者
Guo, J [1 ]
Goasguen, S [1 ]
Lundstrom, M [1 ]
Datta, S [1 ]
机构
[1] Purdue Univ, W Lafayette, IN 47907 USA
关键词
Electronic structure - Electrostatics - Semiconductor insulator boundaries - Silicon compounds - Charge coupled devices - Oxide semiconductors - MOS devices - Yarn - Metal insulator boundaries - Metals;
D O I
10.1063/1.1502188
中图分类号
O59 [应用物理学];
学科分类号
摘要
Carbon nanotube metal-insulator-semiconductor capacitors are examined theoretically. For the densely packed array of nanotubes on a planar insulator, the capacitance per tube is reduced due to the screening of the charge on the gate plane by the neighboring nanotubes. In contrast to the silicon metal-oxide-semiconductor capacitors, the calculated C-V curves reflect the local peaks of the one-dimensional density-of-states in the nanotube. This effect provides the possibility to use C-V measurements to diagnose the electronic structures of nanotubes. Results of the electrostatic calculations can also be applied to estimate the upper-limit on-current of carbon nanotube field-effect transistors. (C) 2002 American Institute of Physics.
引用
收藏
页码:1486 / 1488
页数:3
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