Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating

被引：25

作者：

Asano, Kosuke ^{[1
,2
]}

Yokoyama, Satoshi ^{[2
]}

Kemmochi, Atsushi ^{[2
]}

Yatagai, Toyohiko ^{[1
]}

机构：

[1] Utsunomiya Univ, Ctr Opt Res & Educ, Utsunomiya, Tochigi 3218585, Japan

[2] Canon Inc, Micro Device R&D Ctr, Hiratsuka, Kanagawa 2540013, Japan

来源：

APPLIED OPTICS | 2014年 / 53卷 / 13期

关键词：

SURFACE-RELIEF GRATINGS; COUPLED-WAVE ANALYSIS; AL; LITHOGRAPHY;

D O I：

10.1364/AO.53.002942

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A wire grid polarizer comprised of chromium oxide is designed for a micro-lithography system using an ArF excimer laser. Optical properties for some material candidates are calculated using a rigorous coupled-wave analysis. The chromium oxide wire grid polarizer with a 90 nm period is fabricated by a double-patterning technique using KrF lithography and dry etching. The extinction ratio of the grating is greater than 20 dB (100:1) at a wavelength of 193 nm. Differences between the calculated and experimental results are discussed. (C) 2014 Optical Society of America

引用

页码：2942 / 2948

页数：7

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