Novel magnetic random access memory cell consisting of magnetic tunnel junction connected in parallel with negative differential resistance device

被引:7
作者
Uemura, T [1 ]
Honma, S [1 ]
Marukame, T [1 ]
Yamamoto, M [1 ]
机构
[1] Hokkaido Univ, Div Elect & Informat Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 4B期
关键词
MRAM; magnetic tunnel junction; negative differential resistance; tunnel diode; tunnel magnetoresistance;
D O I
10.1143/JJAP.43.2114
中图分类号
O59 [应用物理学];
学科分类号
摘要
A novel magnetic random access memory (MRAM) cell consisting of a magnetic tunnel junction (MTJ) and negative differential resistance (NDR) device connected in parallel is described. The NDR characteristics are used to increase the effective magnetoresistance (MR) ratio of the MTJ. Circuit simulations were performed for the memory cell with a triple-barrier resonant-tunneling diode (RTD) to confirm the efficacy of the basic operation. Furthermore, a hybrid circuit built from the CoFe-based MTJ and GaAs-based interband tunnel diode was fabricated. The circuit showed that the effective MR ratio was enhanced almost tenfold from its original value of 11% to 103%.
引用
收藏
页码:2114 / 2117
页数:4
相关论文
共 18 条
  • [1] A monolithic 4-bit 2-Gsps resonant tunneling analog-to-digital converter
    Broekaert, TPE
    Brar, B
    van der Wagt, JPA
    Seabaugh, AC
    Morris, FJ
    Moise, TS
    Beam, EA
    Frazier, GA
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1998, 33 (09) : 1342 - 1349
  • [2] A 1-mbit MRAM based on 1T1MTJ bit-cell integrated with copper interconnects
    Durlam, M
    Naji, PJ
    Omair, A
    DeHerrera, M
    Calder, J
    Slaughter, JM
    Engel, BN
    Rizzo, ND
    Grynkewich, G
    Butcher, B
    Tracy, C
    Smith, K
    Kyler, KW
    Ren, JJ
    Molla, JA
    Feil, WA
    Williams, RG
    Tehrani, S
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2003, 38 (05) : 769 - 773
  • [3] High tunnel magnetoresistance in epitaxial Fe/MgO/Fe tunnel junctions
    Faure-Vincent, J
    Tiusan, C
    Jouguelet, E
    Canet, F
    Sajieddine, M
    Bellouard, C
    Popova, E
    Hehn, M
    Montaigne, F
    Schuhl, A
    [J]. APPLIED PHYSICS LETTERS, 2003, 82 (25) : 4507 - 4509
  • [4] Nonvolatile reprogrammable logic elements using hybrid resonant tunneling diode-giant magnetoresistance circuits
    Hanbicki, AT
    Magno, R
    Cheng, SF
    Park, YD
    Bracker, AS
    Jonker, BT
    [J]. APPLIED PHYSICS LETTERS, 2001, 79 (08) : 1190 - 1192
  • [5] TUNNELING BETWEEN FERROMAGNETIC-FILMS
    JULLIERE, M
    [J]. PHYSICS LETTERS A, 1975, 54 (03) : 225 - 226
  • [6] High-speed and low-power operation of a resonant tunneling logic gate MOBILE
    Maezawa, K
    Matsuzaki, H
    Yamamoto, M
    Otsuji, T
    [J]. IEEE ELECTRON DEVICE LETTERS, 1998, 19 (03) : 80 - 82
  • [7] Digital circuit applications of resonant tunneling devices
    Mazumder, P
    Kulkarni, S
    Bhattacharya, M
    Sun, JP
    Haddad, GI
    [J]. PROCEEDINGS OF THE IEEE, 1998, 86 (04) : 664 - 686
  • [8] Memories of tomorrow
    Reohr, W
    Honigschmid, H
    Robertazzi, R
    Gogl, D
    Pesavento, F
    Lammers, S
    Lewis, K
    Arndt, C
    Lu, Y
    Viehmann, H
    Scheuerlein, R
    Wang, LK
    Trouilloud, P
    Parkin, S
    Gallagher, W
    Müller, G
    [J]. IEEE CIRCUITS & DEVICES, 2002, 18 (05): : 17 - 27
  • [9] Correlation between barrier width, barrier height, and DC bias voltage dependences on the magnetoresistance ratio in Ir-Mn exchange biased single and double tunnel junctions
    Saito, Y
    Amano, M
    Nakajima, K
    Takahashi, S
    Sagoi, M
    Inomata, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2000, 39 (10B): : L1035 - L1038
  • [10] IN0.53GA0.47AS/ALAS RESONANT-TUNNELING DIODES WITH SWITCHING TIME OF 1.5PS
    SHIMIZU, N
    NAGATSUMA, T
    WAHO, T
    SHINAGAWA, M
    YAITA, M
    YAMAMOTO, M
    [J]. ELECTRONICS LETTERS, 1995, 31 (19) : 1695 - 1697