Big Data Emergence in Semiconductor Manufacturing Advanced Process Control

被引:0
作者
Moyne, James [1 ]
Samantaray, Jamini [1 ]
Armacost, Mike [1 ]
机构
[1] Appl Global Serv, Appl Mat, Santa Clara, CA USA
来源
2015 26TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC) | 2015年
关键词
Big Data; Prediction; Predictive Maintenance; Virtual Metrology; yield prediction;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As requirements on data volumes, rates, quality, merging and analytics increase exponentially in the digital universe, semiconductor manufacturers are faced with a need for new approaches to data management and use across the fab. These are often termed "big data" challenges. In our industry big data solutions will be key to scaling Advanced Process Control (APC) solutions to finer levels of control and diagnostics. However the main impact will be to better enable more effective predictive technologies such as Predictive Maintenance (PdM), Virtual Metrology (VM) and yield prediction, all of which utilize data from APC capabilities. PdM represents one area where big data solutions are generating significant benefits across a variety of process types. Moving to big data solutions involves addressing the aforementioned requirements either with enhancements of existing systems or moving to more big data friendly platforms. The latter applied to APC systems provides quantifiable cost-of-ownership and speed improvements, thereby better enabling high quality prediction solutions.
引用
收藏
页码:130 / 135
页数:6
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