Asymmetric phase masks for extended depth of field

被引：86
作者：
Castro, A
Ojeda-Castañeda, J
机构：
[1] Inst Nacl Astrofis Opt & Electr, Puebla 72000, Mexico
[2] Univ Las Amer, Escuela Ciencias, Cholula 72820, Puebla, Mexico
来源：
APPLIED OPTICS | 2004年 / 43卷 / 17期
关键词：
D O I：
10.1364/AO.43.003474
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We present a family of asymmetric phase masks that extends the depth of field of an optical system. To verify our proposal, we compute several modulation transfer functions with focus errors, and we report numerical simulations of the images that can be achieved by use of our proposed procedure. (C) 2004 Optical Society of America.
引用
收藏
页码：3474 / 3479
页数：6
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