GaInAsP/GaInP/AlGaInP MOCVD-grown diode lasers emitting at 808 nm

被引:4
|
作者
Aluev, A. V. [1 ]
Leshko, A. Yu. [2 ]
Lyutetskiy, A. V. [2 ]
Pikhtin, N. A. [2 ]
Slipchenko, S. O. [2 ]
Fetisova, N. V. [2 ]
Chelny, A. A. [1 ]
Shamakhov, V. V. [1 ]
Simakov, V. A. [2 ]
Tarasov, I. S. [2 ]
机构
[1] POLYUS Res & Dev Inst, Moscow 117342, Russia
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
基金
俄罗斯基础研究基金会;
关键词
SEPARATE-CONFINEMENT HETEROSTRUCTURES; INTERNAL OPTICAL LOSS; WAVE-GUIDE; SEMICONDUCTOR-LASERS; OUTPUT POWER; LAMBDA;
D O I
10.1134/S1063782609040241
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The MOCVD epitaxy has been used to grow the GaInAsP/GaInP/AlGaInP laser heterostructures with a narrow symmetric waveguide and broad asymmetric waveguide. Mesa stripe 100 mu m aperture diode lasers emitting at 808 nm were manufactured. It is shown that a SiO2/Si dielectric mirror coating of Fabry-Perot faces of Al-free semiconductor lasers does not result in catastrophic optical mirror damage. It is found that the maximum optical output power of Al-free diode lasers is limited by catastrophic optical damage of the laser heterostructure. Maximum values of optical output power of 5.1 and 9.9 W have been attained in diode lasers with a narrow symmetric waveguide and broad asymmetric waveguide, respectively.
引用
收藏
页码:532 / 536
页数:5
相关论文
共 50 条
  • [1] GaInAsP/GaInP/AlGaInP MOCVD-grown diode lasers emitting at 808 nm
    A. V. Aluev
    A. Yu. Leshko
    A. V. Lyutetskiy
    N. A. Pikhtin
    S. O. Slipchenko
    N. V. Fetisova
    A. A. Chelny
    V. V. Shamakhov
    V. A. Simakov
    I. S. Tarasov
    Semiconductors, 2009, 43 : 532 - 536
  • [2] The Simulation analysis of GaInAsP/GaInP Diode Lasers Emitting at 808 nm
    Gai, Kebin
    Li, Lin
    Zhao, Jinlong
    Wang, Yong
    Li, Te
    Lu, Peng
    Su, Chang
    Li, Zhanguo
    Liu, GuoJun
    2012 INTERNATIONAL CONFERENCE ON OPTOELECTRONICS AND MICROELECTRONICS (ICOM), 2012, : 138 - 141
  • [3] MOCVD GaInAsP/GaInP/AlGaInP laser structures emitting at 780 nm
    Vinokurov, DA
    Zorina, SA
    Kapitonov, VA
    Leshko, AY
    Lyutetskii, AV
    Nikolaev, DN
    Pikhtin, NA
    Stankevich, AL
    Fetisova, NV
    Shamakhov, VV
    Tarasov, IS
    SEMICONDUCTORS, 2003, 37 (12) : 1421 - 1424
  • [4] MOCVD GaInAsP/GaInP/AlGaInP laser structures emitting at 780 nm
    D. A. Vinokurov
    S. A. Zorina
    V. A. Kapitonov
    A. Yu. Leshko
    A. V. Lyutetskii
    D. N. Nikolaev
    N. A. Pikhtin
    A. L. Stankevich
    N. V. Fetisova
    V. V. Shamakhov
    I. S. Tarasov
    Semiconductors, 2003, 37 : 1421 - 1424
  • [5] DISORDERING OF THE ORDERED STRUCTURE IN MOCVD-GROWN GAINP AND ALGAINP BY IMPURITY DIFFUSION AND THERMAL ANNEALING
    GAVRILOVIC, P
    DABKOWSKI, FP
    MEEHAN, K
    WILLIAMS, JE
    STUTIUS, W
    HSIEH, KC
    HOLONYAK, N
    SHAHID, MA
    MAHAJAN, S
    JOURNAL OF CRYSTAL GROWTH, 1988, 93 (1-4) : 426 - 433
  • [6] Diode Lasers Emitting at 1190 nm with a Highly Strained GaInAs Quantum Well and GaAsP Compensating Layers MOCVD-grown on a GaAs Substrate
    Vinokurov, D. A.
    Nikolaev, D. N.
    Pikhtin, N. A.
    Stankevich, A. L.
    Shamakhov, V. V.
    Bondarev, A. D.
    Rudova, N. A.
    Tarasov, I. S.
    SEMICONDUCTORS, 2011, 45 (09) : 1227 - 1230
  • [7] Diode lasers emitting at 1220 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    Vinokurov, D. A.
    Kapitonov, V. A.
    Nikolaev, D. N.
    Pikhtin, N. A.
    Stankevich, A. L.
    Shamakhov, V. V.
    Bondarev, A. D.
    Vavilova, L. S.
    Tarasov, I. S.
    SEMICONDUCTORS, 2011, 45 (10) : 1364 - 1368
  • [8] Diode lasers emitting at 1220 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    D. A. Vinokurov
    V. A. Kapitonov
    D. N. Nikolaev
    N. A. Pikhtin
    A. L. Stankevich
    V. V. Shamakhov
    A. D. Bondarev
    L. S. Vavilova
    I. S. Tarasov
    Semiconductors, 2011, 45 : 1364 - 1368
  • [9] Diode lasers emitting at 1190 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate
    D. A. Vinokurov
    D. N. Nikolaev
    N. A. Pikhtin
    A. L. Stankevich
    V. V. Shamakhov
    A. D. Bondarev
    N. A. Rudova
    I. S. Tarasov
    Semiconductors, 2011, 45 : 1227 - 1230
  • [10] InGaAsP/GaInP/AlGaInP 0.8 μm QW lasers grown by MOCVD using TBP and TBAs
    Dong, JR
    Teng, JH
    Chua, SJ
    Wang, YJ
    Foo, BC
    Yin, R
    JOURNAL OF CRYSTAL GROWTH, 2005, 281 (2-4) : 323 - 327