Record High-Proximity-Induced Anomalous Hall Effect in (BixSb1-x)2Te3 Thin Film Grown on CrGeTe3 Substrate

被引:42
|
作者
Yao, Xiong [1 ,2 ]
Gao, Bin [3 ]
Han, Myung-Geun [4 ]
Jain, Deepti [2 ]
Moon, Jisoo [2 ]
Kim, Jae Wook [2 ]
Zhu, Yimei [4 ]
Cheong, Sang-Wook [1 ,2 ]
Oh, Seongshik [1 ,2 ]
机构
[1] Rutgers State Univ, Ctr Quantum Mat Synth, Piscataway, NJ 08854 USA
[2] Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
[3] Rice Univ, Dept Phys & Astron, Houston, TX 77005 USA
[4] Brookhaven Natl Lab, Condensed Matter Phys & Mat Sci, Upton, NY 11973 USA
关键词
Magnetic proximity effect; anomalous Hall effect; CrGeTe3; (BixSb1-x)(2)Te-3; magnetic topological insulator; TOPOLOGICAL INSULATORS; MAGNETIC ORDER; FERROMAGNETISM; STATE; HETEROSTRUCTURE; PHASE;
D O I
10.1021/acs.nanolett.9b01495
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Quantum anomalous Hall effect (QAHE) can only be realized at extremely low temperatures in magnetically doped topological insulators (TIs) due to limitations inherent with the doping process. In an effort to boost the quantization temperature of QAHE, the magnetic proximity effect in magnetic insulator/TI heterostructures has been extensively investigated. However, the observed anomalous Hall resistance has never been more than several ohms, presumably owing to the interfacial disorders caused by the structural and chemical mismatch. Here, we show that, by growing (BixSb1-x)(2)Te-3 (BST) thin films on structurally and chemically well-matched, ferromagnetic-insulating CrGeTe3 (CGT) substrates, the proximity-induced anomalous Hall resistance can be enhanced by more than an order of magnitude. This sheds light on the importance of structural and chemical matches for magnetic insulator/TI proximity systems.
引用
收藏
页码:4567 / 4573
页数:7
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