Spray pyrolysis deposition of undoped SnO2 and In2O3 films and their structural properties

被引:29
|
作者
Korotcenkov, G. [1 ]
Cho, B. K. [1 ]
机构
[1] Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, 123 Cheomdangwagi Ro, Gwangju 61005, South Korea
基金
新加坡国家研究基金会;
关键词
Morphology; Grain size; Rate of growth; Texturing; Thickness; Faceting; Stress; OXIDE THIN-FILMS; INDIUM TIN OXIDE; CHEMICAL-VAPOR-DEPOSITION; FIELD-EFFECT TRANSISTORS; OPTICAL-PROPERTIES; ELECTRICAL-PROPERTIES; PHYSICAL-PROPERTIES; SUBSTRATE-TEMPERATURE; GROWTH-MECHANISM; DIOXIDE FILMS;
D O I
10.1016/j.pcrysgrow.2016.12.001
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper the results of structural analysis of the SnO2 and In2O3 films deposited by spray pyrolysis are presented. The main goals of this analysis are summarizing the results obtained in this field, highlighting a correlation between parameters of film deposition and the material structure and formulating some general regularities, typical for metal oxides. Peculiarities arid mechanisms of pyrosol deposition as well as advantages and disadvantages of this technology for deposition of the films with required parameters were also discussed. It is shown that this technology has great potential for controlling structural parameters of metal oxides such as thickness, the grain size, texturing, roughness, the grain faceting and the porosity. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1 / 47
页数:47
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