Technology Scaling Challenges and Opportunities of Memory Devices

被引:115
作者
Lee, Seok-Hee [1 ]
机构
[1] SK Hynix Inc, 2091 Gyeongchung Daero, Icheon Si 17336, Gyeonggi Do, South Korea
来源
2016 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) | 2016年
关键词
D O I
10.2147/IPRP.S92448
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Challenges in scaling of semiconductor memory technologies are reviewed with the focus on DRAM and NAND Flash while demands for memory improvement in the ICT industry are increasing. This paper introduces evolutionary and revolutionary paths to overcome scaling challenges of current and emerging memory technologies along with some promising solutions.
引用
收藏
页数:8
相关论文
共 13 条
  • [1] Choi E.-S., 2012, 2012 International Electron Devices Meeting, p9.4.1, DOI DOI 10.1109/IEDM.2012.6479011
  • [2] Higashiki Tatsuhiko, 2015, SPIE ADV LITHOGRAPHY
  • [3] Hong S.J., 2010, IEDM, P837
  • [4] Jang J, 2009, 2009 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P192
  • [5] Katsumata R, 2009, 2009 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P136
  • [6] Kim Hyeong-Soo, 2009, INT S EUVL 2009
  • [7] Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors
    Kim, Seong Keun
    Choi, Gyu-Jin
    Lee, Sang Young
    Seo, Minha
    Lee, Sang Woon
    Han, Jeon Hwan
    Ahn, Hyo-Shin
    Han, Seungwu
    Hwang, Cheol Seong
    [J]. ADVANCED MATERIALS, 2008, 20 (08) : 1429 - +
  • [8] Lee Seok-Hee, 2016, ISCA KEYNOTE
  • [9] Masuoka F., 1987, 1987 International Electron Devices Meeting, IEDM. Technical Digeset (Cat. No.87CH2515-5), P552, DOI 10.1109/IEDM.1987.191485
  • [10] NEALE RG, 1970, ELECTRONICS, V43, P56