Epitaxial Growth and Air-Stability of Monolayer Antimonene on PdTe2

被引:512
作者
Wu, Xu [1 ,2 ]
Shao, Yan [1 ,2 ]
Liu, Hang [1 ,2 ]
Feng, Zili [1 ,2 ]
Wang, Ye-Liang [1 ,2 ,3 ,4 ]
Sun, Jia-Tao [1 ,2 ]
Liu, Chen [5 ]
Wang, Jia-Ou [5 ]
Liu, Zhong-Liu [1 ,2 ]
Zhu, Shi-Yu [1 ,2 ]
Wang, Yu-Qi [1 ,2 ]
Du, Shi-Xuan [1 ,2 ,3 ,4 ]
Shi, You-Guo [1 ,2 ]
Ibrahim, Kurash [5 ]
Gao, Hong-Jun [1 ,2 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Univ Chinese Acad Sci, Beijing 100190, Peoples R China
[3] Collaborat Innovat Ctr Quantum Matter, Beijing 100084, Peoples R China
[4] Beijing Key Lab Nanomat & Nanodevices, Beijing 100190, Peoples R China
[5] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
ELECTRON LOCALIZATION; GERMANENE; SILICENE; LAYER;
D O I
10.1002/adma.201605407
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Monolayer antimonene is fabricated on PdTe2 by an epitaxial method. Monolayer antimonene is theoretically predicted to have a large bandgap for nanoelectronic devices. Air-exposure experiments indicate amazing chemical stability, which is great for device fabrication. A method to fabricate high-quality monolayer antimonene with several great properties for novel electronic and optoelectronic applications is provided.
引用
收藏
页数:7
相关论文
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