Fabrication of Cr nanostructures with the scanning tunnelling microscope

被引：9
|
作者：
Xie, W
Dai, X
Xu, LS
Allee, DA
Spector, J
机构：
[1] LUCENT TECHNOL INC,ALLENTOWN,PA 18103
[2] CYPRESS SEMICOND CORP,SAN JOSE,CA 95134
[3] ARIZONA STATE UNIV,DEPT ELECT ENGN,TEMPE,AZ 85287
[4] ROSS TECHNOL INC,AUSTIN,TX 78735
来源：
NANOTECHNOLOGY | 1997年 / 8卷 / 02期
关键词：
D O I：
10.1088/0957-4484/8/2/007
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.
引用
收藏
页码：88 / 93
页数：6
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