Worst case total dose radiation response of 0.35 μm SOICMOSFETs

被引:51
作者
Liu, ST [1 ]
Balster, S
Sinha, S
Jenkins, WC
机构
[1] Honeywell Inc, Solid State Elect Ctr, Plymouth, MN 55441 USA
[2] USN, Res Lab, Washington, DC 20375 USA
关键词
D O I
10.1109/23.819159
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Through experimental results and analysis by TSUPREM4/MEDICI simulations, the worst ease back gate total dose bias condition is established for body tied SOI NMOSFETs. Utilizing the worst-case bias condition, a recently proposed model that describes the back n-channel threshold voltage shift as a function of total dose, TSUPREM4/MEDICI simulations, and circuit level SPICE simulations, a methodology to model post-rad standby current is developed and presented. This methodology requires the extraction of fundamental starting material/material preparation constants, and then can be utilized to examine post-rad stand-by current at the device and circuit level as function of total dose. Good agreement between experimental results and simulations is demonstrated.
引用
收藏
页码:1817 / 1823
页数:7
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