Vapor-deposited thin films with negative real refractive index in the visible regime

被引：36

作者：

Jen, Yi-Jun ^{[1
]}

Lakhtakia, Akhlesh ^{[2
,3
]}

Yu, Ching-Wei ^{[1
]}

Lin, Chin-Te ^{[1
]}

机构：

[1] Natl Taipei Univ Technol, Dept Electroopt Engn, Taipei 106, Taiwan

[2] Penn State Univ, Mat Res Inst, University Pk, PA 16802 USA

[3] Penn State Univ, Dept Engn Sci & Mech, University Pk, PA 16802 USA

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 10期

关键词：

METAMATERIALS;

D O I：

10.1364/OE.17.007784

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well-established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials. (C) 2009 Optical Society of America

引用

页码：7784 / 7789

页数：6

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