A new category of particles at 65nm technology and below

被引：0

作者：

Rathei, Dieter ^{[1
]}

Neuber, Andreas ^{[2
]}

机构：

[1] Dr Yield Software & Solut, Graz, Austria

[2] MW Zander, Stuttgart, Germany

来源：

2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP | 2006年

关键词：

particle size distribution; yield models; ultrafine particles; semiconductor manufacturing; defect density;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We aligned experience from yield analysis with knowledge from aerosol physics and found strong evidence that semiconductor manufacturers will face a new category of particles in the next technology nodes at and below 65nm.

引用

页码：380 / 382

页数：3

共 4 条

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