Optical modeling of black silicon using an effective medium/multi-layer approach

被引:23
作者
Elsayed, Ahmed A. [1 ]
Sabry, Yasser M. [1 ,2 ]
Marty, Frederic [3 ]
Bourouina, Tarik [2 ,3 ]
Khalil, Diaa [1 ,2 ]
机构
[1] Ain Shams Univ, Fac Engn, ECE Dept, 1 El Sarayat St, Cairo 11517, Egypt
[2] Si Ware Syst, 3 Khaled Ibn Al Waleed St, Cairo 11361, Egypt
[3] Univ Paris Est, Lab ESYCOM EA 2552, ESIEE Paris, Noisy Le Grand, France
来源
OPTICS EXPRESS | 2018年 / 26卷 / 10期
关键词
COUPLED-WAVE ANALYSIS; SOLAR-CELLS; NANOWIRE ARRAYS; POLARIZATION; EMISSIVITY; ABSORPTION; INDEX; SI; TEMPERATURE; EFFICIENCY;
D O I
10.1364/OE.26.013443
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this work, black silicon (BSi) structures including nanocones and nanowires are modeled using effective medium theory (EMT), where each structure is assumed to be a multilayer structure of varying effective index, and its optical scattering in the infrared range is studied in terms of its total reflectance, transmittance and absorptance using the transfer matrix method (TMM). The different mechanisms of the intrinsic absorption of silicon are taken into account, which translates into proper modeling of its complex refraction index, depending on several parameters including the doping level. The model validity is studied by comparing the results with the rigorous coupled wave analysis and is found to be in good agreement. The effect of the aspect ratio, the spacing between the structure features and the structure disordered nature are all considered. Moreover, the results of the proposed model are compared with reflectance measurements of a fabricated BSi sample, in addition to other measurements reported in the literature for Silicon Nanowires (SiNWs). The TMM along with EMT proves to be a convenient method for modeling BSi due to its simple implementation and computational speed. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
引用
收藏
页码:13443 / 13460
页数:18
相关论文
共 44 条
  • [1] Effect of doping level during rapid thermal processing of multilayer structures
    Abramson, AR
    Nieva, P
    Tada, H
    Zavracky, P
    Miaoulis, IN
    Wong, PY
    [J]. JOURNAL OF MATERIALS RESEARCH, 1999, 14 (06) : 2402 - 2410
  • [2] Black silicon-based infrared radiation source
    Anwar, Momen
    Sabry, Yasser
    Basset, Philippe
    Marty, Frederic
    Bourouina, Tarik
    Khalil, Diaa
    [J]. SILICON PHOTONICS XI, 2016, 9752
  • [4] Cengel Y. A., 2006, HEAT MASS TRANSFER P
  • [6] THEORETICAL DEPENDENCE OF INFRARED-ABSORPTION IN BULK-DOPED SILICON ON CARRIER CONCENTRATION
    HAVA, S
    AUSLENDER, M
    [J]. APPLIED OPTICS, 1993, 32 (07) : 1122 - 1125
  • [7] Microstructuring of silicon with femtosecond laser pulses
    Her, TH
    Finlay, RJ
    Wu, C
    Deliwala, S
    Mazur, E
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (12) : 1673 - 1675
  • [8] Characterization of Si nanorods by spectroscopic ellipsometry with efficient theoretical modeling
    Hsu, Shih-Hsin
    Liu, En-Shao
    Chang, Yia-Chung
    Hilfiker, James N.
    Kim, Young Dong
    Kim, Tae Jung
    Lin, Chun-Jung
    Lin, Gong-Ru
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (04): : 876 - 879
  • [9] Hugonin J. P., 2005, RETICOLO SOFTWARE GR
  • [10] Antireflective silicon surface with vertical-aligned silicon nanowires realized by simple wet chemical etching processes
    Hung, Yung-Jr
    Lee, San-Liang
    Wu, Kai-Chung
    Tai, Yian
    Pan, Yen-Ting
    [J]. OPTICS EXPRESS, 2011, 19 (17): : 15792 - 15802