Equivalent junction method to predict 3-D effect of curved-abrupt p-n junctions

被引:4
作者
He, J [1 ]
Xi, XM
Chan, MS
Hu, CM
Li, YX
Zhang, X
Huang, R
Wang, YY
机构
[1] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Elect Res Lab, Berkeley, CA 94720 USA
关键词
breakdown voltage; curvature of the lateral radius; curve effect; three-dimensional (3-D) p-n junction;
D O I
10.1109/TED.2002.1013296
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this brief, an equivalent junction method is proposed to study three-dimensional (3-D) effect of the lateral curvature on curved-abrupt junctions. Analytical expressions including 3-D effect are derived to calculate the breakdown voltage, peak electrical field, and maximum depletion layer width of curved-abrupt junctions. The breakdown voltages calculated from the new analytic expression have been verified by the numerical simulation and experimental data. The equivalent junction model provides a simple mean for device engineers to estimate the required substrate doping concentration, lateral curvature, junction depth and depletion width of a planar p-n junction with a specific breakdown voltage.
引用
收藏
页码:1322 / 1325
页数:4
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