Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation

被引:2
作者
Li Jinlong [1 ]
Sun Mingren [2 ]
Ma Xinxin [2 ]
Huang Feng [1 ]
Xue Qunji [1 ]
机构
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo Key Lab Marine Protect Mat, Ningbo 315201, Zhejiang, Peoples R China
[2] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China
关键词
Ti6Al4V; Oxygen-implanted layer; Annealing; Hardness; Scratch resistance; TITANIUM-OXIDE FILMS; DEPOSITION; DIFFUSION; TI6A14V;
D O I
10.1016/j.surfcoat.2012.06.001
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ti6Al4V was implanted by oxygen plasma based ion implantation at pulsed negative voltages of 50 kV with a fluence of 4 x 10(17) O/cm(2). The implanting temperature of below 180 degrees C was controlled by an oil cooling working table. Subsequent annealing was applied the implanted samples in vacuum at 600 degrees C, 650 degrees C and 700 degrees C, respectively. The influence of annealing conditions on hardness and scratch resistance of the oxygen-implanted layer was investigated. The annealing at a lower temperature below 650 degrees C makes the hardness peak widen and shift into the substrate. Scratch resistance of the oxygen implanted layer also was improved significantly. While the temperature increases to 650 degrees C and 700 degrees C, annealing induces a hardness valley value, which is even far lower than that of the substrate. At the same time, scratch resistance deteriorates for the oxygen implanted layer. All annealing samples have a higher elasticity recover than the implanted samples. Crown Copyright (C) 2012 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:S224 / S227
页数:4
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