Ultralow-Loss CMOS Copper Plasmonic Waveguides

被引:84
作者
Fedyanin, Dmitry Yu. [1 ]
Yakubovsky, Dmitry I. [1 ]
Kirtaev, Roman V. [1 ]
Volkov, Valentyn S. [1 ,2 ]
机构
[1] Moscow Inst Phys & Technol, Lab Nanoopt & Plasmon, Dolgoprudnyi 141700, Russia
[2] Univ Southern Denmark, Ctr Nano Opt, DK-5230 Odense M, Denmark
基金
俄罗斯科学基金会;
关键词
Copper plasmonics; plasmonic nanocircuitry; CMOS plasmonics; hybrid plasmonic waveguide; near-field optical microscopy; SURFACE-PLASMON;
D O I
10.1021/acs.nanolett.5b03942
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Surface plasmon polaritons can give a unique opportunity to manipulate light at a scale well below the diffraction limit reducing the size of optical components down to that of nanoelectronic circuits. At the same time, plasmonics is mostly based on noble metals, which are not compatible with micro electronics manufacturing technologies. This prevents plasmonic components from integration with both silicon photonics and silicon microelectronics. Here, we demonstrate ultralow-loss copper plasmonic waveguides fabricated in a simple complementary metal-oxide semiconductor (CMOS) compatible process, which can outperform gold plasmonic waveguides simultaneously providing long (>40 mu m) propagation length and deep subwavelength (similar to lambda(2)/50, where lambda is the free-space wavelength) mode confinement in the telecommunication spectral range. These results create the backbone for the development of a CMOS plasmonic platform and its integration in future electronic chips.
引用
收藏
页码:362 / 366
页数:5
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