Modelling of dissolution kinetics of thin amorphous chalcogenide films

被引:6
|
作者
Popescu, M. [1 ]
Sava, F. [1 ]
Lorinczi, A. [1 ]
Velea, A. [1 ]
Vlcek, M. [2 ]
Jain, H. [3 ]
机构
[1] Natl Inst Mat Phys, Bucharest 77125, Romania
[2] Univ Pardubice, Dept Gen & Inorgan Chem, Fac Chem Technol, Pardubice 53210, Czech Republic
[3] Lehigh Univ, PC Rossin Coll Engn & Appl Sci, Bethlehem, PA 18015 USA
关键词
amorphous chalcogenide film; dissolution kinetics; GRATINGS; SURFACE; AS2S3;
D O I
10.1080/09500830902960117
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A theoretical relationship for the dissolution kinetics of thin chalcogenide films is proposed. The influence of light irradiation on the film dissolution is taken into account. The theoretical curves are in good agreement with the experimental dissolution results obtained for As2S3 thin amorphous films.
引用
收藏
页码:370 / 376
页数:7
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