Study of metal assisted anisotropic chemical etching of silicon for high aspect ratio in crystalline silicon solar cells

被引：14

作者：

Lee, Youngseok ^{[1
]}

Kim, Heeseok ^{[2
]}

Hussain, Shahzada Qamar ^{[1
,3
]}

Han, Sangmyung ^{[2
]}

Balaji, Nagarajan ^{[1
]}

Lee, Youn-Jung ^{[2
]}

Lee, Jeahyung ^{[2
]}

Yi, Junsin ^{[2
]}

机构：

[1] Sungkyunkwan Univ, Dept Energy Sci, Suwon 440746, South Korea

[2] Sungkyunkwan Univ, Coll Informat & Commun Engn, Suwon 440746, South Korea

[3] COMSATS Inst Informat Technol, Dept Phys, Lahore 54000, Pakistan

来源：

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | 2015年 / 40卷

关键词：

Aspect ratio; Light scattering; Metal assisted chemical etching; Funnel shaped structure; Silicon solar cell; SF6/AR PLASMA; HAZE RATIO; RIE;

D O I：

10.1016/j.mssp.2015.07.011

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Textured surface is commonly used to enhance the efficiency of silicon solar cells by reducing the overall reflectance and improving the light scattering. In this study, a comparison between isotropic and anisotropic etching methods was investigated. The deep funnel shaped structures with high aspect ratio are proposed for better light trapping with low reflectance in crystalline silicon solar cells. The anisotropic metal assisted chemical etching (MACE) was used to form the funnel shaped structures with various aspect ratios. The funnel shaped structures showed an average reflectance of 14.75% while it was 15.77% for the pillar shaped structures. The average reflectance was further reduced to 9.49% using deep funnel shaped structures with an aspect ratio of 1:1.18. The deep funnel shaped structures with high aspect ratios can be employed for high performance of crystalline silicon solar cells. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：391 / 396

页数：6

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