Focused ion beam;
Atomic force microscopy;
Nanotechnology;
Nanodiagnostics;
Ion beam milling;
D O I:
10.1016/j.microrel.2015.06.079
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this work the results of experimental studies of a fabrication of advanced probes for Atomic Force Microscopy (AFM) using Focused Ion Beam (FIB) and nanolithography are reported. Ability to restore the functionality of broken AFM probe tips is shown. The superior performance of FIB-fabricated probes by observing AFM images of the nanostructures is demonstrated. It is shown that the formation of multiprobe AFM cantilevers by FIB-induced deposition of tungsten allows creating an electrical measurement tool for nanotechnology and high-performance instrument for probe nanolithography. It is shown that the use of modified cantilevers for the diagnostics of submicron structures allows one to minimize the artefacts of AFM images, as well as to increase the accuracy of the obtained results. (C) 2015 Elsevier Ltd. All rights reserved.
机构:
Penn State Univ, Northeast Ctr Excellence Pavement Technol, Larson Transportat Inst, University Pk, PA 16802 USAPenn State Univ, Northeast Ctr Excellence Pavement Technol, Larson Transportat Inst, University Pk, PA 16802 USA
Solaimanian, Mansour
Chen, Xuan
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机构:
Penn State Univ, Dept Civil & Environm Engn, University Pk, PA USAPenn State Univ, Northeast Ctr Excellence Pavement Technol, Larson Transportat Inst, University Pk, PA 16802 USA