Fabrication of advanced probes for atomic force microscopy using focused ion beam

被引：23

作者：

Ageev, O. A. ^{[1
]}

Kolomiytsev, A. S. ^{[1
]}

Bykov, A. V. ^{[2
]}

Smirnov, V. A. ^{[1
]}

Kots, I. N. ^{[1
]}

机构：

[1] Southern Fed Univ, Rostov Na Donu 344006, Russia

[2] NT MDT Co, Moscow 124482, Russia

来源：

MICROELECTRONICS RELIABILITY | 2015年 / 55卷 / 9-10期

关键词：

Focused ion beam; Atomic force microscopy; Nanotechnology; Nanodiagnostics; Ion beam milling;

D O I：

10.1016/j.microrel.2015.06.079

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work the results of experimental studies of a fabrication of advanced probes for Atomic Force Microscopy (AFM) using Focused Ion Beam (FIB) and nanolithography are reported. Ability to restore the functionality of broken AFM probe tips is shown. The superior performance of FIB-fabricated probes by observing AFM images of the nanostructures is demonstrated. It is shown that the formation of multiprobe AFM cantilevers by FIB-induced deposition of tungsten allows creating an electrical measurement tool for nanotechnology and high-performance instrument for probe nanolithography. It is shown that the use of modified cantilevers for the diagnostics of submicron structures allows one to minimize the artefacts of AFM images, as well as to increase the accuracy of the obtained results. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：2131 / 2134

页数：4

共 8 条

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[8] [No title captured]

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