Expanding thermal plasma for fast deposition of scratch-resistant SiCxHyOz films

被引：23
作者：
Barrell, Y
Creatore, M
Schaepkens, M
Iacovangelo, CD
Miebach, T
van de Sanden, MCM
机构：
[1] Eindhoven Univ Technol, Dept Appl Phys Equilibrium & Transport Plasmas, NL-5600 MB Eindhoven, Netherlands
[2] GE Co, Global Res Ctr, Schenectady, NY 12301 USA
来源：
SURFACE & COATINGS TECHNOLOGY | 2004年 / 180卷
关键词：
expanding thermal plasma; silicon dioxide-like films; ellipsometry; mass spectrometry; X-ray photon spectroscopy;
D O I：
10.1016/j.surfcoat.2003.10.072
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The Ar/O-2/hexamethyidisiloxane-fed expanding thermal plasma setup is employed for the deposition of scratch-resistant silicone films on polycarbonate with the purpose of replacing glass by polymers in the architectural and transportation industry. It is shown that the versatile control of parameters in the ETP setup (i.e. arc current, gas flow rates and working pressure) enables specific tuning of the film properties (i.e. chemical composition, optical and mechanical properties). The gas phase is monitored by means of mass spectrometry and cavity ringdown spectroscopy. hi situ/ex situ ellipsometry is applied for the optical characterisation of the film. The film composition is determined by means of X-ray photoelectron spectroscopy and the mechanical properties are obtained using nano-indentation measurements. The control parameters are tuned such that the final scratch-resistant films are carbon-deficient and have a strong SiOSi network: stoichiometry SiC0.6HyO1. The low refractive index of 1.42 is due to the presence of residual voids in the film network. The hardness and Young's modulus of the film is 1.2 GPa and 12 GPa, respectively. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：367 / 371
页数：5
相关论文
共 13 条
  • [1] BUSCH KW, 1999, CAVITY RINGDOWN SPEC
  • [2] Ellipsometric characterization of expanding thermal plasma deposited SiO2-like films
    Creatore, M
    Kilic, M
    O'Brien, K
    Groenen, R
    van de Sanden, MCM
    [J]. THIN SOLID FILMS, 2003, 427 (1-2) : 137 - 141
  • [3] Creatore M, 2002, MATER RES SOC SYMP P, V715, P101
  • [4] Argon ion-induced dissociation of acetylene in an expanding Ar/C2H2 plasma
    de Graaf, A
    van Hest, MFAM
    van de Sanden, MCM
    Letourneur, KGY
    Schram, DC
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (20) : 2927 - 2929
  • [5] Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy
    Engeln, R
    Letourneur, KGY
    Boogaarts, MGH
    van de Sanden, MCM
    Schram, DC
    [J]. CHEMICAL PHYSICS LETTERS, 1999, 310 (5-6) : 405 - 410
  • [6] Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate
    Gielen, JWAM
    vandeSanden, MCM
    Schram, DC
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (02) : 152 - 154
  • [7] Effect of substrate conditions on the plasma beam deposition of amorphous hydrogenated carbon
    Gielen, JWAM
    Kessels, WMM
    vandeSanden, MCM
    Schram, DC
    [J]. JOURNAL OF APPLIED PHYSICS, 1997, 82 (05) : 2643 - 2654
  • [8] Cavity ring down detection of SiH3 in a remote SiH4 plasma and comparison with model calculations and mass spectrometry
    Kessels, WMM
    Leroux, A
    Boogaarts, MGH
    Hoefnagels, JPM
    van de Sanden, MCM
    Schram, DC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (02): : 467 - 476
  • [9] Transport of ground-state hydrogen atoms in a plasma expansion
    Mazouffre, S
    Boogaarts, MGH
    Bakker, ISJ
    Vankan, P
    Engeln, R
    Schram, DC
    [J]. PHYSICAL REVIEW E, 2001, 64 (01): : 11 - 016411
  • [10] High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor
    Schaepkens, M
    Selezneva, S
    Moeleker, P
    Iacovangelo, CD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 1266 - 1271
12