Response to "Comment on 'Hydrogen-oxygen interaction in silicon at around 50°C' [J. Appl. Phys. 87, 4635 (2000)]

被引：2

作者：

Markevich, VP

Suezawa, M

机构：

[1] Inst Solid State & Semicond Phys, Minsk 220072, BELARUS

[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 2000年 / 87卷 / 09期

关键词：

D O I：

10.1063/1.373118

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4637 / 4637

页数：1

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