RF magnetron sputtering deposition of NiO/Ni bilayer and approach of the Magnetic behavior using the Preisach model

被引：4

作者：

Bendjerad, A. ^{[1
,2
]}

Boukhtache, S. ^{[1
]}

Benhaya, A. ^{[2
]}

Lahmar, A. ^{[3
]}

Zergoug, M. ^{[4
]}

Luneau, D. ^{[5
]}

机构：

[1] Univ Batna 2, Dept Elect Engn, LEB Res Lab, Batna, Algeria

[2] Univ Batna 2, LEA Lab, Clean Room, Batna, Algeria

[3] Univ Picardie Jules Vernes, LPMC, Amiens, France

[4] CSC, BP 64 Cheraga, Algiers, Algeria

[5] Univ Claude Bernard Lyon 1, Lab Multimat, UMR 5615, F-69622 Villeurbanne, France

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2017年 / 428卷

关键词：

Ni/NiO bilayer; Magnetic properties; Preisach model; HYSTERESIS OPERATOR; POWER LOSSES; CURVES; FILM;

D O I：

10.1016/j.jmmm.2016.12.049

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Bilayer of nickel and nickel oxide were deposited on glass substrates using RF magnetron sputtering technique. The magnetic properties of the prepared thin films were carried out at room temperature in both parallel and perpendicular magnetic field to the sample. The Preisach model was applied to provide a mathematical model of the magnetic hysteresis loop in the case of parallel geometry, along the easy axis of the bi-layer NiO / Ni. Good agreement was obtained between the theoretical and experimental results.

引用

页码：377 / 381

页数：5

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