EMC3-EIRENE modelling of tungsten behavior under resonant magnetic perturbations on EAST: Effects of tungsten sputtering and impurity screening

被引:12
作者
Dai, S. Y. [1 ]
Zhang, H. M. [2 ]
Lyu, B. [2 ]
Sun, Y. W. [2 ]
Jia, M. N. [2 ]
Feng, Y. [3 ]
Wang, Z. X. [1 ]
Wang, D. Z. [1 ]
机构
[1] Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
[2] Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
[3] Max Planck Inst Plasma Phys, D-17491 Greifswald, Germany
基金
中国国家自然科学基金;
关键词
resonant magnetic perturbation; impurity sputtering; impurity screening; TRANSPORT;
D O I
10.1088/1361-6587/abbf86
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The studies on tungsten (W) sputtering and transport characteristics on EAST tokamak under resonant magnetic perturbation (RMP) fields have been performed with the three-dimensional edge transport code EMC3-EIRENE. The estimation of the W sputtering flux has been carried out based on EMC3-EIRENE modeling for RMP and no RMP applications. The W sputtering flux shows a small difference between RMP and no RMP cases due to weak sensitivity of W sputtering yield on deuterium impact energy for low edge plasma density. However, for high edge plasma density, the strong dependence of W sputtering yield on deuterium impact energy comes into play, which results in a remarkable difference in the W sputtering flux between RMP and no RMP cases. Impacts of the W impurity perpendicular transport on W ions transport have been investigated. With low W perpendicular transport coefficient for RMP case, the edge plasma has a better W ions screening effect for high edge plasma density. The increased W perpendicular transport coefficient results in a good W ions screening effect for both high and low edge plasma densities.
引用
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页数:10
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