Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition

被引：274

作者：

Hod, Idan ^{[1
]}

Bury, Wojciech ^{[1
,2
]}

Karlin, David M. ^{[1
]}

Deria, Pravas ^{[1
]}

Kung, Chung-Wei ^{[1
]}

Katz, Michael J. ^{[1
]}

So, Monica ^{[1
]}

Klahr, Benjamin ^{[1
]}

Jin, Danni ^{[3
]}

Chung, Yip-Wah ^{[3
]}

Odom, Teri W.

Farha, Omar K. ^{[4
]}

Hupp, Joseph T.

机构：

[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA

[2] Warsaw Univ Technol, Dept Chem, PL-00664 Warsaw, Poland

[3] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA

[4] King Abdulaziz Univ, Fac Sci, Dept Chem, Jeddah, Saudi Arabia

来源：

ADVANCED MATERIALS | 2014年 / 26卷 / 36期

关键词：

metal organic frameworks; electrophoretic deposition; thin films; electrochemical; FABRICATION; NUCLEATION; ALUMINA; UIO-66;

D O I：

10.1002/adma.201401940

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano-and micro-particulate, thin-film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al-MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin films that exhibit full electrochemical activity.

引用

收藏

页码：6295 / 6300

页数：6

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