Nondestructive picosecond-ultrasonic characterization of Mo/Si extreme ultraviolet multilayer reflection coatings

被引:6
|
作者
Pu, NW [1 ]
Bokor, J
Jeong, ST
Zhao, RA
机构
[1] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Dept Mat Sci & Mineral Engn, Berkeley, CA 94720 USA
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关键词
D O I
10.1116/1.590945
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have used noncontact, nondestructive picosecond-ultrasonic techniques to characterize Mo/Si multilayer reflection coatings for extreme ultraviolet (EUV) lithography. Using our alternating-pump technique; we successfully excited and detected the two lowest frequency localized acoustic-phonon surface modes. By measuring their vibration frequencies simultaneously, we can extract the two key parameters for EUV reflector performance: d (bilayer thickness) and Gamma (thickness ratio of Mo layer to the bilayer) of the Mo/Si multilayers. To demonstrate the utility of this technique, we measured the surface-mode frequencies and extracted the values of d and Gamma for six mirrors. Good agreement with the results of at-wavelength EUV reflectometry was found. Damage to coatings caused by the pump and probe laser beams was also studied, and found to be negligible given our data-acquisition time. (C) 1999 American Vacuum Society. [S0734-211X(99)10806-0].
引用
收藏
页码:3014 / 3018
页数:5
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