X-ray emission as a potential hazard during ultrashort pulse laser material processing

被引:26
作者
Legall, Herbert [1 ]
Schwanke, Christoph [1 ]
Pentzien, Simone [1 ]
Dittmar, Guenter [2 ]
Bonse, Joern [1 ]
Krueger, Joerg [1 ]
机构
[1] Bundesanstalt Mat Forsch & Prufung BAM, Unter Eichen 87, D-12205 Berlin, Germany
[2] Steinbeis Transferzentrum Tech Beratung & Entwick, Albrecht Erhardt Str 17, D-73433 Aalen, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2018年 / 124卷 / 06期
关键词
SPECTROSCOPY; SPECTROMETER; THROUGHPUT; PHOTONS; CDTE;
D O I
10.1007/s00339-018-1828-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In laser machining with ultrashort laser pulses unwanted X-ray radiation in the keV range can be generated when a critical laser intensity is exceeded. Even if the emitted X-ray dose per pulse is low, high laser repetition rates can lead to an accumulation of X-ray doses beyond exposure safety limits. For 925 fs pulse duration at a center wavelength of 1030 nm, the X-ray emission was investigated up to an intensity of 2.6 x 10(14) W/cm(2). The experiments were performed in air with a thin disk laser at a repetition rate of 400 kHz. X-ray spectra and doses were measured for various planar target materials covering a wide range of the periodic table from aluminum to tungsten. Without radiation shielding, the measured radiation doses at this high repetition rate clearly exceed the regulatory limits. Estimations for an adequate radiation shielding are provided.
引用
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页数:8
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