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In situ transmission electron microscopy study of the nucleation and grain growth of Ge2Sb2Te5 thin films
被引:37
|作者:
Park, Yu Jin
Lee, Jeong Yong
[1
]
Kim, Yong Tae
机构:
[1] Korea Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] Korea Inst Sci & Technol, Semicond Mat & Devices Lab, Seoul 136791, South Korea
关键词:
Ge2Sb2Te5;
transmission electron microscopy;
nucleation;
grain growth;
D O I:
10.1016/j.apsusc.2005.10.026
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The nucleation and grain growth of the Ge2Sb2Te5 (GST) thin films were studied using high voltage electron microscope operated at 1250 kV. As a result, we have found that 2 nm-sized nucleus forms as a cluster which atoms are arranged regularly at the stage of nucleation prior to the formation of grains having crystal structure. The high-resolution transmission electron microscopy study and fast-Fourier transformations revealed that coexistence of face-centered-cubic (FCC) and hexagonal structure occurs, and formation of twin defect is found in the hexagonal structure during the grain growth as the annealing temperature is increased. GST grain having the hexagonal structure grow from the surface, and the growth proceeded perpendicular to the [0 0 0 1], namely the path parallel to the (0 0 0 1) plane. Consequently, grain growth to a large-scale result in a lengthened shape. (c) 2005 Elsevier B.V. All rights reserved.
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页码:8102 / 8106
页数:5
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