Ion beam lithography using single ions

被引：11
作者：
Alves, A.
Reichart, P.
Siegele, R.
Johnston, P. N.
Jamieson, D. N.
机构：
[1] RMIT Univ, Appl Phys, Melbourne, Vic 3001, Australia
[2] Univ Melbourne, Sch Phys, Microanalyt Res Ctr, Melbourne, Vic 3010, Australia
[3] Australian Nucl Sci & Technol Org, Menai, NSW 2234, Australia
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2006年 / 249卷
关键词：
ion beam lithography; PMMA; high aspect ratio structures; nuclear microprobe; single ion counting; photonic crystals; ion tracks; latent damage; track etching;
D O I：
10.1016/j.nimb.2006.03.128
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Presented here is a study to determine the conditions whereby holes etched along single ion tracks can be produced. Using standard tools of ion beam analysis a strategy has been developed to count single ions incident on a PMMA film spun onto a Si photodiode that functions as a detector. We investigate the sensitivity of PMMA to single ions as a function of the incident ion energy, mass and the PMMA development parameters. Non-contact atomic force microscopy (AFM) has been used to image the openings of holes etched along single ion tracks confirming the PMMA is sensitive to the passage of specific single ions. A high aspect ratio Si nanowhisker cantilever has been utilised to perform a quantitative analysis of the holes which are up to 45 run in diameter for 71 MeV Cu ions. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：730 / 733
页数：4
相关论文
共 16 条
[1]   Characterization of heavy ion tracks in polymers by transmission electron microscopy [J].
Adla, A ;
Fuess, H ;
Trautmann, C .
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2003, 41 (22) :2892-2901
[2]   Swift ion effects in polymers: industrial applications [J].
Apel, P .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 208 :11-20
[3]   Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods [J].
Lüthi, R ;
Schlittler, RR ;
Brugger, J ;
Vettiger, P ;
Welland, ME ;
Gimzewski, JK .
APPLIED PHYSICS LETTERS, 1999, 75 (09) :1314-1316
[4]   The sea mouse and the photonic crystal [J].
McPhedran, RC ;
Nicorovici, NA ;
McKenzie, DR ;
Botten, LC ;
Parker, AR ;
Rouse, GW .
AUSTRALIAN JOURNAL OF CHEMISTRY, 2001, 54 (04) :241-244
[5]   Surface tracks in polymers induced by MeV heavy-ion impacts [J].
Papaléo, RM ;
Farenzena, LS ;
de Araújo, MA ;
Livi, RP .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 151 (1-4) :135-139
[6]  
POLMAN A, 2001, MRS B, V26
[7]   Solid state quantum computer development in silicon with single ion implantation [J].
Schenkel, T ;
Persaud, A ;
Park, SJ ;
Nilsson, J ;
Bokor, J ;
Liddle, JA ;
Keller, R ;
Schneider, DH ;
Cheng, DW ;
Humphries, DE .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (11) :7017-7024
[8]  
SRINIVASARO M, 1998, P MAT RES SOC MAT OP, V2, P117
[9]  
TAYLOR ML, IN PRESS NUCL INST B
[10]   Micromachining by ion track lithography [J].
Thornell, G ;
Spohr, R ;
van Veldhuizen, EJ ;
Hjort, K .
SENSORS AND ACTUATORS A-PHYSICAL, 1999, 73 (1-2) :176-183
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